Venkata Madhuri
VFSTR University, India
Title: A comparative study on the growth of V2O5 thin films at various substrate temperatures
Biography
Biography: Venkata Madhuri
Abstract
Pure vanadium pentoxide thin films were prepared by electron beam evaporation technique onto well cleaned corning 7059 glass substrates. The films were prepared at an oxygen partial pressure of 2´10-4 mbar and at substrate temperatures ranging from RT to 450 oC. The deposited films were characterized to study the effect of substrate temperature on the structural and optical properties. As the films deposited at room temperature are amorphous in nature which was observed from XRD and Raman studies and confirmed by the AFM image, the studies are aimed at physical properties of the films deposited at substrate temperatures 250 oC, 350 oC and 450 oC. The XRD data revealed the orthorhombic structure of the films with well-defined peaks and the crystallite sizes were calculated by Debye-Scherrer formula. The variation in crystallite size with respect to substrate temperature and the average grain size from AFM studies were also discussed. The Raman spectra of the films deposited at Ts from 250 oC to 450 oC are well resolved and exhibiting the polycrystalline nature of the films. The optical band gap values are calculated from the optical transmittance spectra